located_in
type: Property
preferred label: Location

has_url
type: Property
preferred label: Website(s)
IAO_0000111: has URL

workflow state
type: Property

resource_description
type: Property
preferred label: Resource Description

model_number
type: Property
preferred label: Model Number
IAO_0000111: model number

eagle-i_synonym
type: Property
preferred label: Additional Name

has_contact
type: Property
preferred label: Contact
IAO_0000111: has contact

tjohnson (Tenille Johnson)

Reactive Ion Etch - Chlorine-based
type: material_entity
type: instrument
created: 2012-07-13T20:07:27.688Z
model_number: Minilock II
type: independent_continuant
resource_description: Chlorine based chemistry for reactive ion etching: - Aluminum - Aluminum oxide - Silicon - Any material requiring chlorine chemistry - Process gases include Cl2, BCI3, CF4, O2, N2
type: reactive ion etcher
type: continuant
type: entity
eagle-i_synonym: RIE Trion Technologies Minilock II
type: Thing
workflow state: Published
has_url: http://www.vanderbilt.edu/vinse/facilities/instruments/rie+trion-technologies+minilock-ii-rie
modified: 2015-02-18T20:27:08.619Z
type: processed material

lrobins (Lisa Robins)

Vanderbilt Institute of Nanoscale Science and Engineering

entity
type: Class

reactive ion etcher
preferred label: Reactive ion etcher
type: Class

instrument
preferred label: Instrument
IAO_0000111: instrument
type: Class

processed material
IAO_0000111: processed material
type: Class

continuant
type: Class

Schmidt, Ben, Ph.D.

independent_continuant
type: Class

rpearse (Richard Pearse)

material_entity
type: Class